High Reflective Mirrors Specification
• Substrate : UV Grade fused silica
• Dimension : Ø25.4 or 50.8 (-0.0/-0.1)
• Center Thickness, mm : 6.0mm(±0.1)
• Surface Quality, S-D : 20-10 Scratch-Dig:
• Surface Accuracy, P-V S1 : λ/4 @ 633nm on clear aperture surface
S2 : Grinding surface
• Clear Aperture : 90%
• Chamfer : Protective bevel as needed
| UVFS HR Mirrors | | Material | Part No. | Description | Dia(mm) | Thk(mm) | Wavelength | Data Sheet | UVFS | MHR1U6IR | 25.4mmØ x 6.0mmThk, UVFS, λ=1030-1080nm 45°, Laser Mirror | 25.40 | 6.00 | 1030-1080nm | PDF | | MHR1U6UV | 25.4mmØ x 6.0mmThk, UVFS, λ=343-355mm 45°, Laser Mirror | 25.40 | 6.00 | 343-355nm | PDF | | MHR1U632 | 25.4mmØ x 6.0mmThk, UVFS, λ=532nm 45°, Laser Mirror | 25.40 | 6.00 | 532nm | PDF | | MHR1U655 | 25.4mmØ x 6.0mmThk, UVFS, λ=355nm 45°, Laser Mirror | 25.40 | 6.00 | 355nm | PDF | | MHR1U664 | 25.4mmØ x 6.0mmThk, UVFS, λ=1064nm 45°, Laser Mirror | 25.40 | 6.00 | 1064nm | PDF | | MHR2U6IR | 50.8mmØ x 6.0mmThk, UVFS, λ=1030-1080nm 45°, Laser Mirror | 50.80 | 6.00 | 1030-1080nm | PDF | | MHR2U6UV | 50.8mmØ x 6.0mmThk, UVFS, λ=343-355mm 45°, Laser Mirror | 50.80 | 6.00 | 343-355nm | PDF | | MHR2U632 | 50.8mmØ x 6.0mmThk, UVFS, λ=532nm 45°, Laser Mirror | 50.80 | 6.00 | 532nm | PDF | | MHR2U655 | 50.8mmØ x 6.0mmThk, UVFS, λ=355nm 45°, Laser Mirror | 50.80 | 6.00 | 355nm | PDF | | MHR2U664 | 50.8mmØ x 6.0mmThk, UVFS, λ=1064nm 45°, Laser Mirror | 50.80 | 6.00 | 1064nm | PDF |
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